Jiang, F; Keating, A; Martyniuk, M; Prasad, K; Faraone, L; Dell, JM (IOP Publishing, 2012)
The principal aim of this work was to characterize deep silicon etching at sample temperatures well-below room temperature, using SF6/O2 inductively coupled plasma (ICP) for micro-electro-mechanical systems (MEMS) applications. ...